Merck
All Photos(1)

749044

Sigma-Aldrich

Titanium

sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis

Empirical Formula (Hill Notation):
Ti
CAS Number:
Molecular Weight:
47.87
Número de EC:
Número MDL:
ID de la sustancia en PubChem:

ensayo

99.995% trace metals basis

formulario

solid

temp. de autoignición

860 °F

reaction suitability

core: titanium

resistividad

42.0 μΩ-cm, 20°C

diám. × grosor

3.00 in. × 0.125 in.

bp

3287 °C (lit.)

mp

1660 °C (lit.)

densidad

4.5 g/mL at 25 °C (lit.)

SMILES string

[Ti]

InChI

1S/Ti

InChI key

RTAQQCXQSZGOHL-UHFFFAOYSA-N

Aplicación

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

Código de clase de almacenamiento

13 - Non Combustible Solids

WGK

nwg

Punto de inflamabilidad F

Not applicable

Punto de inflamabilidad C

Not applicable

Certificate of Analysis

Enter Lot Number to search for Certificate of Analysis (COA).

Certificate of Origin

Enter Lot Number to search for Certificate of Origin (COO).

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service