reagent type: catalyst
n20/D 1.464 (lit.)
232 °C (lit.)
14-17 °C (lit.)
0.96 g/mL at 20 °C (lit.)
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Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3
Central nervous system
3 - Flammable liquids
105.8 °F - Pensky-Martens closed cup
41 °C - Pensky-Martens closed cup
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Ask a Scientist here.
In recent years considerable interest in ALD has emerged, mainly due to its ability to controllably coat even very small structures, e.g. nanoor microstructures.
Since the demonstration of the first practical solar cell 60 years ago, research on novel materials, improved solar cell design and structure, and innovative manufacturing processes have all contributed to a continuous increase in the efficiency of photovoltaic (PV) devices.
In this paper, we discuss recent advances in the preparation of various TiO2 porous structures via hard and soft-templating routes. Specifically, we focus on recent developments in TiO2 mesoporous thin films in a combined sol-gel and evaporation-induced self-assembly (EISA) process.
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of sequential cycles of precursor vapors.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand.