Merck
All Photos(1)

767492

Sigma-Aldrich

Silicon

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.999% trace metals basis

Linear Formula:
Si
CAS Number:
Molecular Weight:
28.09
EC Number:
MDL number:
PubChem Substance ID:
NACRES:
NA.23

Quality Level

assay

99.999% trace metals basis

form

solid

reaction suitability

core: silicon

diam. × thickness

2.00 in. × 0.25 in.

bp

2355 °C (lit.)

mp

1410 °C (lit.)

density

2.33 g/mL at 25 °C (lit.)

SMILES string

[Si]

InChI

1S/Si

InChI key

XUIMIQQOPSSXEZ-UHFFFAOYSA-N

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Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition

Packaging

1 ea in rigid mailer

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Certificate of Analysis

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Certificate of Origin

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