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Sub-micron silicon nitride waveguide fabrication using conventional optical lithography.

Optics express (2015-04-04)
Yuewang Huang, Qiancheng Zhao, Lobna Kamyab, Ali Rostami, Filippo Capolino, Ozdal Boyraz
ABSTRACT

We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is measured to have a propagation loss of 0.8dB/cm and nonlinear coefficient of γ = 0.3/W/m. A low anomalous dispersion of <100ps/nm/km is also predicted. This type of waveguide is highly suitable for nonlinear optics. The channels naturally formed on top of the waveguide also make it promising for plasmonics and quantum efficiency enhancement in sensing applications.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Potassium hydroxide, reagent grade, 90%, flakes
Sigma-Aldrich
Potassium hydroxide, technical, ≥85%, powder
Sigma-Aldrich
Potassium hydroxide, pellets, reag. Ph. Eur., ≥85%
Sigma-Aldrich
Potassium hydroxide, puriss., meets analytical specification of Ph. Eur., BP, 85-100.5%, pellets