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Hierarchically functionalized magnetic core/multishell particles and their postsynthetic conversion to polymer capsules.

ACS nano (2015-03-25)
Sophia Schmitt, Martin Silvestre, Manuel Tsotsalas, Anna-Lena Winkler, Artak Shahnas, Sylvain Grosjean, Fabrice Laye, Hartmut Gliemann, Joerg Lahann, Stefan Bräse, Matthias Franzreb, Christof Wöll
ABSTRACT

The controlled synthesis of hierarchically functionalized core/multishell particles is highly desirable for applications in medicine, catalysis, and separation. Here, we describe the synthesis of hierarchically structured metal-organic framework multishells around magnetic core particles (magMOFs) via layer-by-layer (LbL) synthesis. The LbL deposition enables the design of multishell systems, where each MOF shell can be modified to install different functions. Here, we used this approach to create controlled release capsules, in which the inner shell serves as a reservoir and the outer shell serves as a membrane after postsynthetic conversion of the MOF structure to a polymer network. These capsules enable the controlled release of loaded dye molecules, depending on the surrounding media.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Ethyl alcohol, Pure, 190 proof, ACS spectrophotometric grade, 95.0%
Sigma-Aldrich
Dimethyl sulfoxide-d6, 99.9 atom % D
Sigma-Aldrich
Toluene, anhydrous, 99.8%
Sigma-Aldrich
(3-Aminopropyl)triethoxysilane, 99%
Sigma-Aldrich
p-Toluenesulfonic acid monohydrate, ACS reagent, ≥98.5%
Sigma-Aldrich
Dimethyl sulfoxide-d6, 99.9 atom % D, contains 0.03 % (v/v) TMS
Sigma-Aldrich
(3-Aminopropyl)triethoxysilane, ≥98%
Sigma-Aldrich
Dimethyl sulfoxide-d6, "100%", 99.96 atom % D
Sigma-Aldrich
Dimethyl sulfoxide-d6, 99.5 atom % D
Sigma-Aldrich
p-Toluenesulfonic acid monohydrate, ReagentPlus®, ≥98%
Sigma-Aldrich
Propiolic acid, 95%
Sigma-Aldrich
(3-Aminopropyl)triethoxysilane, ≥98.0%
Sigma-Aldrich
Dimethyl sulfoxide-d6, "100%", 99.96 atom % D, contains 0.03 % (v/v) TMS
Sigma-Aldrich
p-Toluenesulfonic acid monohydrate, ≥99% (calc. to H2O free subst.)
Sigma-Aldrich
Dimethyl sulfoxide-d6, 99.9 atom % D, contains 1 % (v/v) TMS
Sigma-Aldrich
Dimethyl sulfoxide-d6, anhydrous, 99.9 atom % D
Sigma-Aldrich
1,1,1-Tris(hydroxymethyl)ethane, ≥98%
Sigma-Aldrich
Dimethyl sulfoxide-d6, "Special HOH", ≥99.9 atom % D
Sigma-Aldrich
Dimethyl sulfoxide-d6, "100%", 99.96 atom % D
Sigma-Aldrich
(3-Aminopropyl)triethoxysilane, packaged for use in deposition systems, ≥98%
Sigma-Aldrich
Dimethyl sulfoxide-d6, "100%", 99.96 atom % D