Merck
All Photos(1)

767492

Sigma-Aldrich

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.999% trace metals basis

Linear Formula:
Si
CAS Number:
Molecular Weight:
28.09
EC 号:
MDL编号:
PubChem化学物质编号:
NACRES:
NA.23

质量水平

100

测定

99.999% trace metals basis

形式

solid

reaction suitability

core: silicon

直径× 厚度

2.00 in. × 0.25 in.

bp

2355 °C (lit.)

mp

1410 °C (lit.)

密度

2.33 g/mL at 25 °C (lit.)

SMILES string

[Si]

InChI

1S/Si

InChI key

XUIMIQQOPSSXEZ-UHFFFAOYSA-N

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应用

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition

包装

1 ea in rigid mailer

储存分类代码

11 - Combustible Solids

WGK

WGK 3

闪点(F)

Not applicable

闪点(C)

Not applicable

Certificate of Analysis

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Certificate of Origin

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