Merck
All Photos(1)

767522

Sigma-Aldrich

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

Synonym(s):
宽度
Empirical Formula (Hill Notation):
W
CAS Number:
Molecular Weight:
183.84
EC 号:
MDL编号:
PubChem化学物质编号:
NACRES:
NA.23

质量水平

100

测定

99.95% trace metals basis

形式

pieces

reaction suitability

core: tungsten

电阻率

4.9 μΩ-cm, 20°C

直径× 厚度

2.00 in. × 0.25 in.

bp

5660 °C (lit.)

mp

3410 °C (lit.)

密度

19.3 g/mL at 25 °C (lit.)

SMILES string

[W]

InChI

1S/W

Inchi Key

WFKWXMTUELFFGS-UHFFFAOYSA-N

应用

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

包装

1 ea in rigid mailer

储存分类代码

13 - Non Combustible Solids

WGK

nwg

闪点(F)

Not applicable

闪点(C)

Not applicable

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Certificate of Origin

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