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  • Uptake and toxicity of copper oxide nanoparticles in cultured primary brain astrocytes.

Uptake and toxicity of copper oxide nanoparticles in cultured primary brain astrocytes.

Nanotoxicology (2013-07-31)
Felix Bulcke, Karsten Thiel, Ralf Dringen
摘要

To test for consequences of an exposure of brain cells to copper oxide nanoparticles (CuO-NPs), we synthesised and characterised dimercaptosuccinate-coated CuO-NPs. These particles had a diameter of around 5 nm as determined by transmission electron microscopy, while their average hydrodynamic diameter in aqueous dispersion was 136 ± 4 nm. Dispersion in cell-culture medium containing 10% fetal calf serum increased the hydrodynamic diameter to 178 ± 12 nm and shifted the zeta potential of the particles from -49 ± 7 mV (in water) to -10 ± 3 mV. Exposure of cultured primary brain astrocytes to CuO-NPs increased the cellular copper levels and compromised the cell viability in a time-, concentration- and temperature-dependent manner. Application of CuO-NPs in concentrations above 100 µM copper (6.4 µg/ml) severely compromised the viability of the cells, as demonstrated by a lowered 3-(4,5-dimethylthiazol-2-yl)-2,5-diphenyltetrazolium bromide reduction capacity, a lowered cellular lactate dehydrogenase activity and an increased membrane permeability for the fluorescent dye propidium iodide. Copper internalisation as well as cell toxicity of astrocytes exposed to CuO-NPs were similar to that observed for cells that had been incubated with copper salts. The CuO-NP-induced toxicity was accompanied by an increase in the generation of reactive oxygen species (ROS) in the cells. Both, ROS formation and cell toxicity in CuO-NP-treated astrocytes, were lowered in the presence of the cell-permeable copper chelator tetrathiomolybdate. These data demonstrate that CuO-NPs are taken up by cultured astrocytes and suggest that excess of internalised CuO-NPs cause cell toxicity by accelerating the formation of ROS.

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Sigma-Aldrich
氧化铜, nanopowder, <50 nm particle size (TEM)
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氧化铜, ACS reagent, ≥99.0%
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氧化铜, powder, <10 μm, 98%
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氧化铜, powder, 99.99% trace metals basis
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钼, foil, thickness 0.1 mm, ≥99.9% trace metals basis
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铝基氧化铜, 14-30 mesh, extent of labeling: 13 wt. % loading
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钼, foil, thickness 0.025 mm, ≥99.9% trace metals basis
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氧化铜, 99.999% trace metals basis
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氧化铜, needles, mixture of CuO and Cu2O, ACS reagent
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氧化铜, powder, 99.995% trace metals basis
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钼, wire, diam. 1.0 mm, 99.95% trace metals basis
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钼, foil, thickness 1.0 mm, ≥99.9% trace metals basis
钼, rod, 100mm, diameter 15.0mm, centerless ground, 99.9%
钼, foil, 150x150mm, thickness 0.20mm, annealed, 99.9%
钼, wire reel, 100m, diameter 0.025mm, hard, 99.95%
钼, wire reel, 10m, diameter 0.05mm, annealed, 99.95%
钼, foil, 6mm disks, thickness 0.5mm, annealed, 99.9%
钼, foil, 6mm disks, thickness 0.75mm, annealed, 99.9%
钼, foil, 8mm disks, thickness 0.005mm, 99.9%
钼, foil, 8mm disks, thickness 0.006mm, 99.9%
钼, foil, 8mm disks, thickness 0.007mm, 99.9%
钼, foil, 8mm disks, thickness 0.008mm, 99.9%
钼, foil, 8mm disks, thickness 0.009mm, 99.9%
钼, foil, 8mm disks, thickness 0.0125mm, 99.9%
钼, foil, 8mm disks, thickness 0.015mm, annealed, 99.9%
钼, foil, 8mm disks, thickness 0.015mm, as rolled, 99.9%
钼, foil, 8mm disks, thickness 0.01mm, 99.9%
钼, foil, 8mm disks, thickness 0.01mm, annealed, 99.9%
钼, foil, 8mm disks, thickness 0.020mm, annealed, 99.9%
钼, foil, 8mm disks, thickness 0.025mm, annealed, 99.9%