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$89.25
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Product Name
Hafnium(IV) oxide, powder, 98%
InChI key
CJNBYAVZURUTKZ-UHFFFAOYSA-N
InChI
1S/Hf.2O
SMILES string
O=[Hf]=O
assay
98%
form
powder
density
9.68 g/mL at 25 °C (lit.)
Quality Level
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Related Categories
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This Item | 203394 | 258202 | 590592 |
|---|---|---|---|
| form powder | form powder | form powder | form powder |
| assay 98% | assay ≥99.95% | assay 98% | assay 99.9% trace metals basis |
| density 9.68 g/mL at 25 °C (lit.) | density 9.68 g/mL at 25 °C (lit.) | density - | density - |
| Quality Level 100 | Quality Level 100 | Quality Level 100 | Quality Level 100 |
Application
- Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
Storage Class
11 - Combustible Solids
wgk
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
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Hi. Can you provide more information on the particle size distribution of Hf dioxide 98%? Is this in micron range or nnano-range?
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