205389

Sigma-Aldrich

Hexamethyldisiloxane

≥98%

Synonym(s):
HMDSO
Linear Formula:
(CH3)3SiOSi(CH3)3
CAS Number:
Molecular Weight:
162.38
Beilstein/REAXYS Number:
1736258
EC Number:
MDL number:
PubChem Substance ID:
NACRES:
NA.22
Pricing and availability is not currently available.

Quality Level

vapor density

>1 (vs air)

assay

≥98%

refractive index

n20/D 1.377 (lit.)

bp

101 °C (lit.)
101 °C

mp

−59 °C (lit.)

density

0.764 g/mL at 20 °C (lit.)

SMILES string

C[Si](C)(C)O[Si](C)(C)C

InChI

1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

InChI key

UQEAIHBTYFGYIE-UHFFFAOYSA-N

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General description

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.

Application

Hexamethyldisiloxane can be used:
  • To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process.
  • To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent, respectively.

Packaging

5, 100, 500 mL in glass bottle

Pictograms

FlameEnvironment

Signal Word

Danger

Hazard Statements

Precautionary Statements

Personal Protective Equipment

dust mask type N95 (US),Eyeshields,Gloves

RIDADR

UN1993 - class 3 - PG 2 - EHS - VP <= 110kPa - Flammable liquids, n.o.s., HI: all

WGK Germany

WGK 2

Flash Point(F)

21.2 °F - closed cup

Flash Point(C)

-6 °C - closed cup

The crystal and molecular structures of disiloxane (at 108 K) and hexamethyldisiloxane (at 148 K).
Barrow MJ, et al.
Acta Crystallographica Section B, Structural Science, Crystal Engineering and Materials, 35(9), 2093-2099 (1979)
Synthesis of plasma-polymerized tetraethoxysilane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge.
Sawada Y, et al.
Journal of Physics D: Applied Physics, 28(8), 1661-1661 (1995)
Ion chemistries in hexamethyldisiloxane.
Jiao CQ, et al.
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films, 23(5), 1295-1304 (2005)
Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under dielectric-barrier discharge (DBD) conditions.
Schmidt-Szalowski K, et al.
Plasmas and polymers, 5(3-4), 173-190 (2000)
Israel Sifuentes-Nieves et al.
International journal of biological macromolecules, 144, 682-689 (2019-12-21)
In the present study, the effect of plasma treatment on the structural properties of three granular corn starches (normal, Hylon V and Hylon VII) was investigated. Thermal (TGA/DSC), structural (XRD/FTIR) and chemical (XPS) properties were evaluated. Plasma treatment resulted in...

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