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408964

Cyclohexyl methacrylate

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

Synonym(s):

Methacrylic acid cyclohexyl ester

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About This Item

Linear Formula:
CH2=C(CH3)COOC6H11
CAS Number:
101-43-9
Molecular Weight:
168.23
UNSPSC Code:
12162002
NACRES:
NA.23
PubChem Substance ID:
24865610
EC Number:
202-943-5
Beilstein/REAXYS Number:
2045235
MDL number:
MFCD00014292

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InChI key

OIWOHHBRDFKZNC-UHFFFAOYSA-N

InChI

1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3

SMILES string

CC(=C)C(=O)OC1CCCCC1

assay

≥97%

form

liquid

contains

~60 ppm monomethyl ether hydroquinone as inhibitor

Quality Level

100

refractive index

n20/D 1.458 (lit.)

bp

68-70 °C/4 mmHg (lit.)

density

0.964 g/mL at 25 °C (lit.)

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1 of 4

This Item
411760234907741108
Cyclohexyl methacrylate ≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

Sigma-Aldrich

408964

Cyclohexyl methacrylate

Furfuryl methacrylate 97%, contains 200 ppm monomethyl ether hydroquinone as inhibitor

Sigma-Aldrich

411760

Furfuryl methacrylate

2-(Dimethylamino)ethyl methacrylate contains 700-1000 ppm monomethyl ether hydroquinone as inhibitor, 98%

Sigma-Aldrich

234907

2-(Dimethylamino)ethyl methacrylate

Pentafluorophenyl methacrylate contains MEHQ as inhibitor, 95%

Sigma-Aldrich

741108

Pentafluorophenyl methacrylate

assay

≥97%

assay

97%

assay

98%

assay

95%

density

0.964 g/mL at 25 °C (lit.)

density

1.078 g/mL at 25 °C (lit.)

density

0.933 g/mL at 25 °C (lit.)

density

1.394 g/mL at 25 °C

contains

~60 ppm monomethyl ether hydroquinone as inhibitor

contains

200 ppm monomethyl ether hydroquinone as inhibitor

contains

700-1000 ppm monomethyl ether hydroquinone as inhibitor

contains

MEHQ as inhibitor

form

liquid

form

liquid

form

liquid

form

liquid

bp

68-70 °C/4 mmHg (lit.)

bp

80-82 °C/5 mmHg (lit.)

bp

182-192 °C (lit.)

bp

-

refractive index

n20/D 1.458 (lit.)

refractive index

n20/D 1.482 (lit.)

refractive index

n20/D 1.439 (lit.)

refractive index

n20/D 1.438

General description

Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.

Application

Cyclohexyl methacrylate can be used:



  • As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.[1]
  • As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.[2]
  • As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.[3]

pictograms

Exclamation mark
GHS07

signalword

Warning

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3

target_organs

Respiratory system

Storage Class

10 - Combustible liquids

wgk

WGK 1

flash_point_f

181.4 °F

flash_point_c

83 °C

ppe

Eyeshields, Gloves, type ABEK (EN14387) respirator filter

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Certificates of Analysis (COA)

Lot/Batch Number
BCCP1499
BCCJ3719
BCCF9533
BCBT5853
BCBS0911V

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High-Performance Luminescent Solar Concentrators Based on Poly (Cyclohexylmethacrylate)(PCHMA) Films
Francisco Jos'e Ostos, et al.
Polymers, 12, 2898-2898 (2020)
Fabrication of light emitting diodes using photo-patternable quantum dot-acrylate resins
Kab Pil Yang, et al.
Journal of Materials Chemistry, 9, 17084-17088 (2021)
Azeotropic Binary Solvent System Containing Nonfluorinated Polymer-Grafted Silica Nanoparticles for the Fabrication of a Superhydrophobic Surface
Kai-Yen Chin, et al.
Langmuir, 39, 9841-9849 (2023)
Florian Jakobs et al.
Materials (Basel, Switzerland), 13(8) (2020-04-29)
For most kinds of active polymer optical fibers, a homogeneous distribution of dye molecules over the entire fiber length and cross section is required. In this study, chemical bonding of dyes to poly(methyl methacrylate) (PMMA) by copolymerization is achieved within
Kai Kan et al.
Nanoscale research letters, 15(1), 51-51 (2020-03-04)
A characteristic effect of a nano-concave-convex structure of a zirconia nanoparticle assembly with an inherent porous structure and huge surface area enabled us to introduce systematic surface modification by thermal treatment to smooth surface and polymer impregnation to mask the
View All Related Papers

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