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651826

Sigma-Aldrich

Chromium etchant

standard

MDL number:
NACRES:
NA.23

Quality Level

grade

standard

composition

volatiles, 85%

color

orange

bp

100 °C/1 atm

density

1.16 g/mL at 25 °C

General description

Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.
Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.

Application

The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si3N4, SiO2, Ti, and W surfaces
For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.

Packaging

500 mL in poly bottle

Features and Benefits

Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.

Signal Word

Danger

Hazard Classifications

Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1

Supplementary Hazards

Storage Class Code

5.1B - Oxidizing hazardous materials

WGK Germany

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Certificate of Analysis

Certificate of Origin

Fabrication and Mechanical Properties Measurements of 3D Microtissues for the Study of Cell-Matrix Interactions.
The Surfaceome, 120(5), 303-328 (2018)
Reconstituting Functional Microtubule-Barrier Interactions.
Methods in Cell Biology, 120(5), 69-90 (2014)
The regeneration and recycle of chromium etching solutions using concentrator cell membrane technology.
Chaudhary AJ, et al.
Chemosphere, 62(5), 841-846 (2006)
Irene Dolado et al.
Advanced materials (Deerfield Beach, Fla.), 32(9), e1906530-e1906530 (2020-01-25)
Van der Waals (vdW) materials host a variety of polaritons, which make them an emerging material platform for manipulating light at the nanoscale. Due to the layered structure of vdW materials, the polaritons can exhibit a hyperbolic dispersion and propagate...
Thermoelectric microconverter for energy harvesting systems.
Carmo J, et al.
IEEE Transactions on Industrial Electronics, 57(3), 861-867 (2010)

Protocols

Negative Photoresist Procedure

Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenience. Etchants are available separately so that the proper etchant can be chosen for a variety of substrate choices.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

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