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736007
Vanadium(V) oxytriisopropoxide
packaged for use in deposition systems
Synonym(s):
Triisopropoxyvanadium(V) oxide, VTIP, Vanadium(V) trisisopropoxide oxide
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25 G
$780.00
$780.00
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About This Item
Linear Formula:
OV(OCH(CH3)2)3
CAS Number:
Molecular Weight:
244.20
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
EC Number:
226-997-4
MDL number:
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InChI key
DSGGJXAUQHKOGQ-UHFFFAOYSA-N
InChI
1S/3C3H7O.O.V/c3*1-3(2)4;;/h3*3H,1-2H3;;/q3*-1;;+3
SMILES string
CC(C)O[V](=O)(OC(C)C)OC(C)C
form
liquid
composition
V, 20.3-21.4% titration (, by potassium permanganate)
reaction suitability
core: vanadium
refractive index
n20/D 1.479 (lit.)
bp
80-82 °C/2 mmHg (lit.)
density
1.035 g/mL at 25 °C (lit.)
Quality Level
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This Item | |||
|---|---|---|---|
| form liquid | form liquid | form liquid | form liquid |
| composition V, 20.3-21.4% titration (by potassium permanganate) | composition V, 20.3-21.4% titration (by potassium permanganate) | composition - | composition - |
| density 1.035 g/mL at 25 °C (lit.) | density 1.035 g/mL at 25 °C (lit.) | density 1.076 g/mL at 25 °C (lit.) | density 1.84 g/mL at 25 °C (lit.) |
| bp 80-82 °C/2 mmHg (lit.) | bp 80-82 °C/2 mmHg (lit.) | bp 82-83 °C/0.25 mmHg (lit.) | bp 126-127 °C (lit.) |
| refractive index n20/D 1.479 (lit.) | refractive index n20/D 1.479 (lit.) | refractive index - | refractive index - |
| reaction suitability core: vanadium | reaction suitability core: vanadium, reagent type: catalyst | reaction suitability core: vanadium, reagent type: catalyst | reaction suitability - |
signalword
Warning
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT SE 3
target_organs
Respiratory system
Storage Class
3 - Flammable liquids
wgk
WGK 3
flash_point_f
113.0 °F - closed cup
flash_point_c
45 °C - closed cup
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Colm Glynn et al.
Nanoscale, 7(47), 20227-20237 (2015-11-18)
Devices composed of transparent materials, particularly those utilizing metal oxides, are of significant interest due to increased demand from industry for higher fidelity transparent thin film transistors, photovoltaics and a myriad of other optoelectronic devices and optics that require more
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Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
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