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Yttrium sputtering target

diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis

Empirical Formula (Hill Notation):
CAS Number:
Molecular Weight:
EC Number:
MDL number:
PubChem Substance ID:

Quality Level


99.9% trace metals basis



reaction suitability

core: yttrium


57 μΩ-cm, 20°C

diam. × thickness

2.00 in. × 0.25 in.


3338 °C (lit.)


1522 °C (lit.)


4.469 g/mL at 25 °C (lit.)

SMILES string




InChI key



Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.


1 ea in rigid mailer

Storage Class Code

13 - Non Combustible Solids



Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Certificate of Analysis

Certificate of Origin

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