773972
Yttrium sputtering target
diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis
Synonym(s):
Yttrium
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About This Item
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assay
99.9% trace metals basis
form
solid
reaction suitability
core: yttrium
resistivity
57 μΩ-cm, 20°C
diam. × thickness
2.00 in. × 0.25 in.
bp
3338 °C (lit.)
mp
1522 °C (lit.)
density
4.469 g/mL at 25 °C (lit.)
SMILES string
[Y]
InChI
1S/Y
InChI key
VWQVUPCCIRVNHF-UHFFFAOYSA-N
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Related Categories
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This Item | GF92156711 | GF32670772 | GF33100298 |
|---|---|---|---|
| form solid | form foil | form foil | form foil |
| assay 99.9% trace metals basis | assay 99% | assay 99% | assay 99% |
| density 4.469 g/mL at 25 °C (lit.) | density 4.469 g/mL at 25 °C (lit.) | density 4.469 g/mL at 25 °C (lit.) | density 4.469 g/mL at 25 °C (lit.) |
| mp 1522 °C (lit.) | mp 1522 °C (lit.) | mp 1522 °C (lit.) | mp 1522 °C (lit.) |
| bp 3338 °C (lit.) | bp 3338 °C (lit.) | bp 3338 °C (lit.) | bp 3338 °C (lit.) |
| reaction suitability core: yttrium | reaction suitability - | reaction suitability - | reaction suitability - |
Application
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.
Storage Class
11 - Combustible Solids
wgk_germany
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
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