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773972

Sigma-Aldrich

Yttrium sputtering target

diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis

Synonym(s):

Yttrium

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About This Item

Empirical Formula (Hill Notation):
Y
CAS Number:
Molecular Weight:
88.91
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

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assay

99.9% trace metals basis

form

solid

reaction suitability

core: yttrium

resistivity

57 μΩ-cm, 20°C

diam. × thickness

2.00 in. × 0.25 in.

bp

3338 °C (lit.)

mp

1522 °C (lit.)

density

4.469 g/mL at 25 °C (lit.)

SMILES string

[Y]

InChI

1S/Y

InChI key

VWQVUPCCIRVNHF-UHFFFAOYSA-N

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1 of 4

This Item
GF92156711GF32670772GF33100298
form

solid

form

foil

form

foil

form

foil

assay

99.9% trace metals basis

assay

99%

assay

99%

assay

99%

density

4.469 g/mL at 25 °C (lit.)

density

4.469 g/mL at 25 °C (lit.)

density

4.469 g/mL at 25 °C (lit.)

density

4.469 g/mL at 25 °C (lit.)

mp

1522 °C (lit.)

mp

1522 °C (lit.)

mp

1522 °C (lit.)

mp

1522 °C (lit.)

bp

3338 °C (lit.)

bp

3338 °C (lit.)

bp

3338 °C (lit.)

bp

3338 °C (lit.)

reaction suitability

core: yttrium

reaction suitability

-

reaction suitability

-

reaction suitability

-

Application

Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.

Storage Class

11 - Combustible Solids

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable


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