774022

Yttrium(III) oxide

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.99% trace metals basis

• Synonym(s): Yttria
• Linear Formula: Y₂O₃
• CAS Number: 1314-36-9
• Molecular Weight: 225.81
• EC Number: 215-233-5
• MDL number: MFCD00011473
• PubChem Substance ID: 329767654
• NACRES: NA.23

Properties

• Quality Level: 100
• assay: 99.99% trace metals basis
• form: powder
• reaction suitability: core: yttrium
• diam. × thickness: 2.00 in. × 0.25 in.
• mp: 2410 °C (lit.)
• density: 5.01 g/mL at 25 °C (lit.)
• SMILES string: O=[Y]O[Y]=O
• InChI: 1S/3O.2Y
• InChI key: SIWVEOZUMHYXCS-UHFFFAOYSA-N

Description

Application

Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium oxide sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing films are used as thermal barrier and protective coatings in thermoelectric devices, rare earth doped yttrium oxide films are studied for phosphor applications.

Packaging

1 ea in glass bottle

Safety Information

• RIDADR: NONH for all modes of transport
• WGK Germany: WGK 1
• Flash Point(F): Not applicable
• Flash Point(C): Not applicable