Chemical vapor deposition

Applied Filters:

facet applications:Chemical vapor deposition

facet content type:Technical Article

Showing 1-12 of 12 results

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

High Purity Metalorganic Precursors for CPV Device Fabrication

Highly reducing or oxidizing species enhance organic semiconductor conductivity by reducing charge-carrier injection barriers.

Savannah ALD System for Atomic Layer Deposition

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

Group 11 Thin Films by Atomic Layer Deposition

Copper metal deposition processes are an essential tool for depositing interconnects used in microelectronic applications, giving group 11 (coinage metals: Copper, Silver, and Gold) an important place in atomic layer deposition (ALD) process development.

Optimal Water Purification for Silica Sensitive Applications

Compare RO vs. EDI vs. ion exchange resins to remove silica from water for silica-sensitive applications (e.g. microelectronics, testing chambers, autoclaves, sterilizers, …).

Silylethyne-substituted Pentacenes

Silylethyne substitution offers an opportunity to tune solubility for application-specific needs and self-assembly for electronic performance and has yielded semiconductors with excellent device performance.

Molybdenum Disulfide: Hydrogen Evolution

Catalytic water splitting produces hydrogen crucial for renewable energy, petroleum refining, and chemical industry applications like methanol production.

Progress in Spintronic Materials

Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.

Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.