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Removal of high concentration dimethyl methylphosphonate in the gas phase by repeated-batch reactions using TiO2.

Journal of hazardous materials (2010-01-05)
Nobuaki Mera, Tsutomu Hirakawa, Taizo Sano, Koji Takeuchi, Yasuo Seto, Nobuaki Negishi
ABSTRACT

The aim of our study is to develop apparatuses that use TiO(2) for effective decontamination of air contaminated by Sarin gas. We performed photocatalytic decomposition of gaseous dimethyl methylphosphonate (DMMP) by TiO(2) and identified the oxidization products. The high activity of TiO(2) (0.01 g) was observed under UV-light irradiation and high concentration DMMP (33.5 microM) was removed rapidly. On the other hand, DMMP was not decreased under UV-light irradiation without TiO(2). This indicates that photocatalytic treatment is very effective for the removal of DMMP. Methanol, formaldehyde, formic acid, methyl formate, CO, CO(2) and H(2)O were detected as the primary products. In the gas phase, no highly poisonous substances were detected. In order to examine the performance of photocatalytic activity during long-term reactions, we performed photocatalytic decomposition by repeated-batch reactions using TiO(2). High photocatalytic activities decreased gradually. Meanwhile, the strong adsorption of TiO(2) against DMMP was observed as photocatalytic activities decreased. During the repeated-batch reactions with the sample scaled up (TiO(2): 0.1g), the total amount of removed DMMP reached 968.5 microM by both photocatalytic decomposition and the strong adsorption of TiO(2). These results suggest the possibility of removing large amounts of DMMP.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Dimethyl methylphosphonate, ≥98%
Sigma-Aldrich
Dimethyl methylphosphonate, purum, ≥97.0% (GC)