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Advanced materials (Deerfield Beach, Fla.)

Initiated chemical vapor deposition-based method for patterning polymer and metal microstructures on curved substrates.


PMID 23011917

Abstract

A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.