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Advanced materials (Deerfield Beach, Fla.)

Atomic layer engineering of perovskite oxides for chemically sharp heterointerfaces.


PMID 23034879

Abstract

Atomic layer engineering enables fabrication of a chemically sharp oxide heterointerface. The interface formation and strain evolution during the initial growth of LaAlO(3) /SrTiO(3) heterostructures by pulsed laser deposition are investigated in search of a means for controlling the atomic-sharpness of the interface. This study shows that inserting a monolayer of LaAlO(3) grown at high oxygen pressure dramatically enhances interface abruptness.