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241172 Sigma-Aldrich

Oxalic acid

ReagentPlus®, ≥99%

  • CAS Number 144-62-7

  • Linear Formula HO2CCO2H

  • Molecular Weight 90.03

  •  Beilstein/REAXYS Number 385686

  •  EC Number 205-634-3

  •  MDL number MFCD00002573

  •  PubChem Substance ID 24854466

  •  NACRES NA.22

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Properties

Related Categories Allium cepa (Onion), Allium sativum (Garlic), Building Blocks, C1 to C5, Carbonyl Compounds,
Quality Level   200
vapor density   4.4 (vs air)
vapor pressure   <0.01 mmHg ( 20 °C)
product line   ReagentPlus®
assay   ≥99%
form   powder or crystals
mp   189.5 °C (dec.) (lit.)
solubility   water: soluble ~108 g/L at 25 °C
density   1.65 g/cm3 at 18.5 °C
SMILES string   OC(=O)C(O)=O
InChI   1S/C2H2O4/c3-1(4)2(5)6/h(H,3,4)(H,5,6)
InChI key   MUBZPKHOEPUJKR-UHFFFAOYSA-N
Gene Information   human ... SRC(6714)

Description

General description

Oxalic acid is present as potential impurity in some active pharmaceutical ingredients.

Application

Oxalic acid may be used as a catalyst to synthesize:
• 2-aryl-1-arylmethyl-1H-benzimidazoles from o-phenylenediamine and aldehydes
• 2-aryl-4,5-diphenyl-1H-imidazoles from benzyl/benzoin, ammonium acetate and aromatic aldehydes
• bis-compounds of indole and 2-naphthol in an aqueous medium

Oxalic acid was used:
• in the synthesis of hemicellulose hydrolysates of yellow poplars
• in the synthesis of three-dimensionally ordered macroporous metal oxides or carbonates via templating with polystyrene spheres
• as supporting electrolyte in the electrochemical synthesis of polyaniline-polypyrrole composite coatings

Packaging

50 g in poly bottle

Legal Information

ReagentPlus is a registered trademark of Sigma-Aldrich Co. LLC

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Personal Protective Equipment 
RIDADR 
NONH for all modes of transport
WGK Germany 
WGK 3
RTECS 
RO2450000
Flash Point(F) 
Not applicable
Flash Point(C) 
Not applicable

Documents

Certificate of Analysis (COA)

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Certificate of Origin (COO)

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Protocols & Articles

Articles

Low Resistivity Nanoscale Devices by Templated Electrochemistry

Mazin Maqableh, Madhukar Reddy (not pictured), Bethanie Stadler* Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455, USA *Email: stadler@u...
Keywords: Deposition, Diffusion, Electrochemical analysis, Electronics, Materials Science, Nanoelectronics, Nanomaterials, PAGE, Semiconductor

Peer-Reviewed Papers
15

References

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