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333395 Sigma-Aldrich

Dichlorosilane

≥99.99% trace metals basis

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Properties

vapor density   3.5 (vs air)
vapor pressure   1254 mmHg ( 20 °C)
assay   ≥99.99% trace metals basis
autoignition temp.   136 °F
expl. lim.   99 %
film resistivity   >50 Ω-cm
bp   8.3 °C (lit.)
mp   −122 °C (lit.)
SMILES string   Cl[SiH2]Cl
InChI   1S/Cl2H2Si/c1-3-2/h3H2
InChI key   MROCJMGDEKINLD-UHFFFAOYSA-N

Description

General description

Dichlorosilane (DCS) is a halogenated silicon based precursor that facilitates the growth of a variety of silane based films such as silicon oxide, silicon nitride, silicon carbide, and epitaxial growth of silica.

Application

DCS is widely used in the synthesis of a variety of silicon-based materials, which find applications in the development of organic electronics based devices, including OFETs, MEMS, NEMS, MOSFETS, and lithium-ion batteries.

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
Supplemental Hazard Statements 
EUH014
RIDADR 
UN 2189 8(2.1)(2.3)
WGK Germany 
WGK 1
RTECS 
VV3050000
Flash Point(F) 
-34.6 °F
Flash Point(C) 
-37 °C
Protocols & Articles
Peer-Reviewed Papers
15

References

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