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398195 Sigma-Aldrich

Lithium tert-butoxide solution

1.0 M in THF

  • CAS Number 1907-33-1

  • Linear Formula (CH3)3COLi

  • Molecular Weight 80.05

  •  Beilstein/REAXYS Number 3620018

  •  MDL number MFCD00050479

  •  PubChem Substance ID 24864726

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Properties

Related Categories Acids & Bases, Bases, Chemical Synthesis, Lithium, Materials Science,
InChI Key   LZWQNOHZMQIFBX-UHFFFAOYSA-N
form   liquid
concentration   1.0 M in THF
bp   67 °C
density   0.888 g/mL at 25 °C

Description

Application

Lithium tert-butoxide solution is generally used as a strong base in organic synthesis.
It can be used:
• For the synthesis of lithium modified silica nano-particles for conductive gel electrolytes.
• As a catalyst for ring-opening polymerization of lactides.
• As a lithium precursor for the synthesis of LiV3O8 nanoparticles by flame spray pyrolysis.

Packaging

50, 250 mL in Sure/Seal™

Safety & Documentation

Safety Information

Signal word 
Danger
Hazard statements 
Precautionary statements 
Supplemental Hazard Statements 
May form explosive peroxides., Reacts violently with water.
RIDADR 
UN 2924 8(3) / PGII
WGK Germany 
3
Flash Point(F) 
-2.2 °F
Flash Point(C) 
-19 °C

Documents

Certificate of Analysis

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Certificate of Origin

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Protocols & Articles

Articles

Acids and Bases

Acids and bases have been used by chemists for centuries, and are among the most fundamental reagents employed in synthetic organic chemistry. This product line ranges from Brønsted and Lewis acids, ...
Chemfiles Volume 1 Article 3

Atomic Layer Deposition of Nanomaterials for Li-Ion Batteries, Fuel Cells, and Solar Cells

Erwin Kessels,* Harm Knoops, Matthieu Weber, Adrie Mackus, and Mariadriana Creatore Department of Applied Physics, Eindhoven University of Technology P.O. Box 513, 5600 MB Eindhoven, The Netherlands ...
Keywords: Adhesion, Atomic layer deposition, Building blocks, Catalysis, Chemical vapor deposition, Crystallization, Deposition, Diffusion, Microscopy, Nanomaterials, Nanotubes, Nucleic acid annealing, Oxidations, Recombination, Reductions, Renewable energy, Scanning electron microscopy, Solar cells

Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications

Department of Mechanical Engineering and Materials Science, One Brookings Drive, Washington University in St. Louis, St. Louis, MO 63130 *Email: parag.banerjee@wustl.edu
Keywords: Atomic layer deposition, Catalysis, Chemical reactions, Degradations, Dehydrogenation, Deposition, Hydrogenations, Ion Exchange, Ligands, Magnetic resonance spectroscopy, Materials Science, Nanomaterials, Oxidations, Photovoltaics, Precipitation, Recombination, Reductions, Renewable energy, Separation, Solar cells, Thin film deposition

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Peer-Reviewed Papers
15

References

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