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  • 523615 - 1,1,3,3-Tetramethyl-1,3-bis[2-(5-norbornen-2-yl)ethyl]disiloxane, mixture of endo and exo

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523615 Sigma-Aldrich

1,1,3,3-Tetramethyl-1,3-bis[2-(5-norbornen-2-yl)ethyl]disiloxane, mixture of endo and exo

  • CAS Number 198570-39-7

  • Empirical Formula (Hill Notation) C22H38OSi2

  • Molecular Weight 374.71

  •  MDL number MFCD02093771

  •  PubChem Substance ID 24874350

  •  NACRES NA.23

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Properties

Related Categories Alicyclic/Etch-Resistant Monomers, Chemical Synthesis, Lithography Monomers, Materials Science, Micro/NanoElectronics,
Quality Level   100
refractive index   n20/D 1.483 (lit.)
bp   272-303 °C (lit.)
density   0.944 g/mL at 25 °C (lit.)
SMILES string   C[Si](C)(CCC1CC2CC1C=C2)O[Si](C)(C)CCC3CC4CC3C=C4
InChI   1S/C22H38OSi2/c1-24(2,11-9-21-15-17-5-7-19(21)13-17)23-25(3,4)12-10-22-16-18-6-8-20(22)14-18/h5-8,17-22H,9-16H2,1-4H3
InChI key   UWRFNCCYPBVADT-UHFFFAOYSA-N

Description

Packaging

5 mL in glass bottle

Safety & Documentation

Safety Information

RIDADR 
NONH for all modes of transport
WGK Germany 
WGK 3
Flash Point(F) 
230.0 °F - closed cup
Flash Point(C) 
110 °C - closed cup
Protocols & Articles

Articles

Etch-Resistant Block Copolymers

Block copolymers offer a means of combining the desirable characteristics of different polymers in a new hybrid material. Polymers consisting of hydrophobic and hydrophilic blocks, for example, can b...
Prof. Padma GopalanProf. Shu Yang
Material Matters 2006, 1.1, 6.
Keywords: Applications, Material Matters, Materials Science, Microscopy, Ozonolysis, Polymerization reactions, Purification, Radical polymerization, Reversible addition-fragmentation chain transfer polymerizations, Scanning electron microscopy, Semiconductor, Transmission electron microscopy

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