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544337 Sigma-Aldrich

5-Norbornen-2-yl(ethyl)chlorodimethylsilane, mixture of endo and exo

95%

Synonym: 2-(5-Norbornenyl)ethyldimethylchlorosilane

  • CAS Number 120543-78-4

  • Empirical Formula (Hill Notation) C11H19ClSi

  • Molecular Weight 214.81

  •  MDL number MFCD03094012

  •  PubChem Substance ID 24878727

  •  NACRES NA.23

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Properties

Related Categories Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Nanomaterials,
assay   95%
refractive index   n20/D 1.48 (lit.)
bp   231-232 °C (lit.)
density   0.991 g/mL at 25 °C (lit.)
SMILES string   C[Si](C)(Cl)CCC1C[C@H]2C[C@@H]1C=C2
InChI   1S/C11H19ClSi/c1-13(2,12)6-5-11-8-9-3-4-10(11)7-9/h3-4,9-11H,5-8H2,1-2H3/t9-,10+,11?/m1/s1
InChI key   UFEKKYNQUHJSEC-JKIOLJMWSA-N

Description

Packaging

1 mL in glass bottle

Safety & Documentation

Safety Information

Symbol 
GHS05  GHS05
Signal word 
Danger
Hazard statements 
Precautionary statements 
RIDADR 
UN 2987 8 / PGII
WGK Germany 
WGK 3
Flash Point(F) 
219.9 °F - closed cup
Flash Point(C) 
104.4 °C - closed cup
Protocols & Articles

Articles

Etch-Resistant Block Copolymers

Block copolymers offer a means of combining the desirable characteristics of different polymers in a new hybrid material. Polymers consisting of hydrophobic and hydrophilic blocks, for example, can b...
Prof. Padma GopalanProf. Shu Yang
Material Matters 2006, 1.1, 6.
Keywords: Applications, Material Matters, Materials Science, Microscopy, Ozonolysis, Polymerization reactions, Purification, Radical polymerization, Reversible addition-fragmentation chain transfer polymerizations, Scanning electron microscopy, Semiconductor, Transmission electron microscopy

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