• USA Home
  • 177806 - Tetraethylammonium hydroxide solution

EMAIL THIS PAGE TO A FRIEND
177806 Sigma-Aldrich

Tetraethylammonium hydroxide solution

20 wt. % in H2O

Synonym: TEA hydroxide

  • CAS Number 77-98-5

  • Linear Formula (C2H5)4N(OH)

  • Molecular Weight 147.26

  •  Beilstein/REAXYS Number 3912961

  •  MDL number MFCD00009024

  •  PubChem Substance ID 57647667

  •  NACRES NA.21

Purchase

Properties

Related Categories Acids & Bases, Ammonium Salts, Bases, Chemical Synthesis, Essential Chemicals,
InChI Key   LRGJRHZIDJQFCL-UHFFFAOYSA-M
Quality Level   200
concentration   20 wt. % in H2O
refractive index   n20/D 1.373
density   1.01 g/mL at 25 °C

Description

General description

The product is 20wt.% solution of tetraethylammonium hydroxide (TEA hydroxide, TENOH) in H2O. TEA hydroxide is a quaternary ammonium hydroxide (QAH). It participates in the synthesis of zeolite beta. TENOH peptized titania aqueous sols have been employed in the preparation of nanocrystalline anatase films.

Packaging

1 kg in poly bottle

100, 500 g in poly bottle

5 kg in poly drum

Safety & Documentation

Safety Information

Symbol 
GHS05  GHS05
Signal word 
Danger
Hazard statements 
Precautionary statements 
RIDADR 
UN 3267 8 / PGII
WGK Germany 
3

Documents

Certificate of Analysis (COA)

Please Enter a Lot Number

Certificate of Origin (COO)

Please Enter a Lot Number

Single- & multi-channel pipettes from BRAND
Protocols & Articles

Related Content

Molarity Calculator & Normality Calculator for Acids & Bases

The molarity calculator tool provides lab-ready directions describing how to prepare an acid or base solution of specified Molarity (M) or Normality (N) from a concentrated acid or base solution. To ...

Peer-Reviewed Papers
15

References

Related Products

Technical Service:

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Bulk Ordering & Pricing:

Need larger quantities for your development, manufacturing or research applications?