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295647 Sigma-Aldrich

Phosphine

electronic grade, ≥99.9995%

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Properties

Related Categories Analytical Standards, Analytical/Chromatography, CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis,
Quality Level   200
grade   electronic grade
vapor density   1.15 (vs air)
assay   ≥99.9995%
form   gas
impurities   <1 ppm Argon (Ar)
  <1 ppm Arsine (AsH3)
  <1 ppm Carbon dioxide (CO2)
  <1 ppm Carbon monoxide (CO)
  <1 ppm Methane (CH4)
  <1 ppm Nitrogen (N2)
  <1 ppm Oxygen (O2)
  <1 ppm Water (H2O)
bp   −87.5 °C (lit.)
transition temp   critical temperature 51.3 °C
Featured Industry   Agriculture
Environmental
SMILES string   P
InChI   1S/H3P/h1H3
InChI key   XYFCBTPGUUZFHI-UHFFFAOYSA-N

Description

General description

Phosphine is an organophosphorus compound that can be used as a ligand with electronic and steric properties. It can be incorporated into the semiconductor to tune the crystallinity and composition of the nanocrystals by enhancing their photoconductive properties.

Application

Phosphine may be used to modify the n-type single walled carbon nanotubes(SWCNTs) for the development of flexible thermoelectric materials. It may also be used as a catalyst in the preparation of cyclobuteno(60)fullerenes which finds potential applications in n-type organic semiconductor.

Phosphine is used primarily in the manufacture of III-IV semiconductor materials by OMCVD and as a dopant in crystalline and amorphous silicon.

Precursor to III-V semiconductor thin films. Also useful as a dopant for crystalline and amorphous silicon.

Packaging

10, 50 g in stainless steel cylinder

Recommended products

Stainless steel regulators Z527416 or Z527424 are recommended.

Safety & Documentation

Safety Information

Signal word 
Danger
Hazard statements 
RIDADR 
UN 2199 2.1(2.3)
WGK Germany 
WGK 2
RTECS 
SY7525000
Flash Point(F) 
Not applicable
Flash Point(C) 
Not applicable

Documents

Certificate of Analysis (COA)

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Certificate of Origin (COO)

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Protocols & Articles

Articles

High Purity Deposition Gases

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Chemical vapor deposition, Deposition

High Purity Metalorganic Precursors for CPV Device Fabrication

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand. Conventional crystalline silicon solar cells have demonstrated remark...
Ravi Kanjolia
Material Matters Volume 5 Article 4
Keywords: Absorption, Chemical vapor deposition, Degradations, Deposition, Mass spectrometry, Nuclear magnetic resonance spectroscopy, Purification, Semiconductor, Solar cells, Spectroscopy, Tissue microarrays, Vaporization

Peer-Reviewed Papers
15

References

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