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463426 Sigma-Aldrich

Trimethylboron-d9

electronic grade, 99.4% (CP), 99 atom % D

Synonym: Trimethylborane- d9

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Properties

Related Categories Boron, CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics,
grade   electronic grade
vapor density   2.3 (vs air)
isotopic purity   99 atom % D
assay   99.4% (CP)
bp   −20.2 °C (lit.)
mp   −161.5 °C (lit.)
mass shift   M+9
SMILES string   [2H]C([2H])([2H])B(C([2H])([2H])[2H])C([2H])([2H])[2H]
InChI   1S/C3H9B/c1-4(2)3/h1-3H3/i1D3,2D3,3D3
InChI key   WXRGABKACDFXMG-GQALSZNTSA-N

Description

Packaging

5 g in stainless steel cylinder

Application

The deposition of trimethylboron-d9 derived boron-carbon films can result in increased device performance.

Recommended products

Stainless steel regulators Z527416 or Z527424 are recommended.

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
RIDADR 
UN 3160PIHB 2.1(2.3)
WGK Germany 
1
Protocols & Articles

Articles

High Purity Deposition Gases

High Purity CVD Gases are used in the deposition of amorphous and epitaxial silicon, SiGe alloys, and dielectrics as well as the manufacture of integrated circuits and photovolatics. The gases are al...
Chemfiles Volume 4 Article 3
Keywords: Chemical vapor deposition, Deposition

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