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517801 Sigma-Aldrich

2,4,6,8,10-Pentamethylcyclopentasiloxane

96%

  • CAS Number 6166-86-5

  • Linear Formula (CH3SiHO)5

  • Molecular Weight 300.64

  •  Beilstein/REAXYS Number 1792134

  •  EC Number 228-204-7

  •  MDL number MFCD00053531

  •  PubChem Substance ID 24873975

  •  NACRES NA.23

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Properties

Related Categories CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Organometallic Reagents,
Quality Level   100
assay   96%
form   liquid
refractive index   n20/D 1.392 (lit.)
bp   54 °C/10 mmHg (lit.)
density   0.992 g/mL at 25 °C (lit.)
storage temp.   2-8°C
SMILES string   C[SiH]1O[SiH](C)O[SiH](C)O[SiH](C)O[SiH](C)O1
InChI   1S/C5H20O5Si5/c1-11-6-12(2)8-14(4)10-15(5)9-13(3)7-11/h11-15H,1-5H3
InChI key   HGPDWMTUQRNTQT-UHFFFAOYSA-N

Description

Packaging

25 mL in glass bottle

Safety & Documentation

Safety Information

Symbol 
GHS02  GHS02
Signal word 
Warning
Hazard statements 
Precautionary statements 
RIDADR 
UN 1993C 3 / PGIII
WGK Germany 
WGK 3
Flash Point(F) 
98.6 °F - closed cup
Flash Point(C) 
37 °C - closed cup
Protocols & Articles

Articles

Recent Progress in Spintronic Materials

Soubantika Palchoudhury,1 Karthik Ramasamy,2* Arunava Gupta3* 1Civil and Chemical Engineering, University of Tennessee at Chattanooga, Chattanooga, Tennessee 37403, USA 2Center for Integrated Nanotec...
Soubantika Palchoudhury, Karthik Ramasamy, Arunava Gupta
By: Dr. Hui Zhu, Material Matters, 2016, 11.4
Keywords: Catalysis, Microscopy, Scanning electron microscopy, Semiconductor, Transmission electron microscopy

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, TX 75080, USA *Email: jiyoung.kim@utdallas.edu
Keywords: Atomic layer deposition, Chemical vapor deposition, Deposition, Inductively coupled plasma, Ligands, Materials Science, Semiconductor, Size-exclusion chromatography

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Hybrid organic-inorganic sol-gel materials containing silica were first called “ORMOSILs” in 1984.1 Since then, the number of hybrid organicinorganic combinations has increased rapidly.2 Hybrid mater...
Lisa C. Klein and Andrei Jitianu
Material Matters, Volume 7, Number 2, 8–14
Keywords: Absorption, Adhesion, Calorimetry, Combustion, Condensations, Deposition, Exothermic, Filtration, Materials Science, Melting, Oxidations, Polymerization reactions, Purification, Semiconductor, Sol-gel, Solar cells, Solvents, Spin coating, Substitutions, Thermal analysis

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