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651486 Sigma-Aldrich

Gallium arsenide

(single crystal substrate), <100>, diam. × thickness 2 in. × 0.5 mm

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Properties

Related Categories Electronic Materials, Materials Science, Micro/NanoElectronics, Organic and Printed Electronics, Single Crystal Substrates,
InChI Key   JBRZTFJDHDCESZ-UHFFFAOYSA-N
form   (single crystal substrate)
resistivity   ≥1E7 Ω-cm
diam. × thickness   2 in. × 0.5 mm
density   5.31 g/mL at 25 °C(lit.)
semiconductor properties   <100>

Description

Packaging

1 ea in rigid mailer

Physical form

cubic (a = 5.6533 Å)

Physical properties

Mobility >=4500 cm2 · V-1 · S-1

Undoped (Si-type semiconductor), EPD < 5 × 104 cm-2, growth technique = LEC & HB

Safety & Documentation

Safety Information

Symbol 
GHS08  GHS08
Signal word 
Danger
Hazard statements 
Precautionary statements 
Target organs 
respiratory and haematopoietic systems
RIDADR 
UN 1557 6.1 / PGII
WGK Germany 
3
Protocols & Articles

Articles

Building and Engineering Micro/Nano Architectures of Single-Walled Carbon Nanotubes for Electronic Applications

1Department of Mechanical and Industrial Engineering, Northeastern University, Boston, MA 02115, USA 2Department of Physics, Northeastern University, Boston, MA 02115, USA 3Department of Mechanical E...
Ji Hao,1 Hyunyoung Jung,1 Younglae Kim,1 Bo Li,1,3 Swastik Kar,2 Yung Joon Jung1*
Material Matters, 2017, 12.1
Keywords: Chromatin immunoprecipitation, Environmental, Nanotubes, Redox Reactions, Reductions, transformation

FePt Nanogranular Films for High Density Heat-assisted Magnetic Recording

Kazuhiro Hono National Institute for Materials Research Tsukuba 305-0047, Japan Email: kazuhiro.hono@nims.go.jp
Keywords: Deposition, Nucleic acid annealing

Recent Progress in Spintronic Materials

Soubantika Palchoudhury,1 Karthik Ramasamy,2* Arunava Gupta3* 1Civil and Chemical Engineering, University of Tennessee at Chattanooga, Chattanooga, Tennessee 37403, USA 2Center for Integrated Nanotec...
Soubantika Palchoudhury, Karthik Ramasamy, Arunava Gupta
By: Dr. Hui Zhu, Material Matters, 2016, 11.4
Keywords: Catalysis, Microscopy, Scanning electron microscopy, Semiconductor, Transmission electron microscopy

Protocols

Negative Photoresist Procedure

Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenien...
Keywords: Adhesion, Diffraction, Evaporation, Polymerization reactions, Size-exclusion chromatography, Solvents

Peer-Reviewed Papers
15

References

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