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651761 Sigma-Aldrich

Negative resist remover I

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Properties

Related Categories Materials Science, Micro/NanoElectronics, Negative Resists, Photoresists, Self Assembly and Lithography More...
Quality Level   100
shelf life   1 yr (cool area away from direct sunlight)
pH   <2 (20 °C)
bp   204-304 °C (lit.)
density   1.00 g/mL at 25 °C (lit.)
storage temp.   2-8°C

Description

General description

Available as part of Negative Photoresist kit 654892

Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.

Packaging

250 mL in glass bottle

Safety & Documentation

Safety Information

Signal word 
Danger
Hazard statements 
RIDADR 
UN 3265 8 / PGII
WGK Germany 
WGK 3
Flash Point(F) 
204.8 °F
Flash Point(C) 
96 °C
Protocols & Articles

Protocols

Negative Photoresist Procedure

Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenien...
Keywords: Adhesion, Diffraction, Evaporation, Polymerization reactions, Size-exclusion chromatography, Solvents

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