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J100028 Sigma-Aldrich

Tris(isopropoxy)silanol

≥99.999% metals basis

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Properties

assay   ≥99.999% metals basis
density   0.940 g/mL at 25 °C (lit.)
SMILES string   CC(C)O[Si](O)(OC(C)C)OC(C)C
InChI   1S/C9H22O4Si/c1-7(2)11-14(10,12-8(3)4)13-9(5)6/h7-10H,1-6H3
InChI key   RLYZRADFTORPLZ-UHFFFAOYSA-N

Description

General description

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Safety & Documentation

Safety Information

RIDADR 
UN 1993 / PGIII
WGK Germany 
3
Flash Point(F) 
170.6 °F
Flash Point(C) 
77 °C

Documents

Certificate of Analysis (COA)

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Protocols & Articles

Articles

Low κ Precursors

Low κ materials address technical challenges of increased chip performance by allowing for the reduction of spacing between metals in multi-level interconnects, interlayer dielectrics and passivation...
Chemfiles Volume 4 Article 3
Keywords: Atomic layer deposition, Chemical vapor deposition, Chromatin immunoprecipitation, Reductions

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