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T82201 Sigma-Aldrich

Triphenylborane

powder, <2% H2O

  • CAS Number 960-71-4

  • Linear Formula (C6H5)3B

  • Molecular Weight 242.12

  •  Beilstein/REAXYS Number 1961313

  •  EC Number 213-504-2

  •  MDL number MFCD00003007

  •  PubChem Substance ID 24900512

  •  NACRES NA.23

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Properties

Related Categories Boron, CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors More...
Quality Level   100
form   powder
  solid
impurities   <2% H2O
bp   203 °C/15 mmHg (lit.)
mp   145 °C (lit.)
SMILES string   c1ccc(cc1)B(c2ccccc2)c3ccccc3
InChI   1S/C18H15B/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18/h1-15H
InChI key   MXSVLWZRHLXFKH-UHFFFAOYSA-N

Description

Application

Triphenylborane powder is a boron based precursor that can be used in the chemical vapor deposition for the development of carbon nanomaterials for application in oxygen reduction reaction, hydrogen storage, transparent conducting films, and fluoride shuffle batteries.

Packaging

2.5, 10 g in glass bottle

Safety & Documentation

Safety Information

Symbol 
GHS02  GHS02
Signal word 
Danger
Hazard statements 
Precautionary statements 
RIDADR 
UN1325 - class 4.1 - PG 2 - Flammable solids, organic, n.o.s., HI: all
WGK Germany 
WGK 3
RTECS 
ED2367500
Flash Point(F) 
Not applicable
Flash Point(C) 
Not applicable
Protocols & Articles

Articles

Nanowire Synthesis: From Top-Down to Bottom-Up

David J. Hill, James F. Cahoon* Department of Chemistry, University of North Carolina at Chapel Hill, USA *Email: jfcahoon@unc.edu
David J. Hill, James F. Cahoon*
Material Matters, 2017, 12.1
Keywords: Absorption, Catalysis, Chemical vapor deposition, Deposition, Electronics, Melting, Microelectronics, Nanomaterials, Redox Reactions, Reductions, Semiconductor

Peer-Reviewed Papers
15

References

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