Multi-Walled Carbon Nanotubes

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Production Method

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755133 Carbon nanotube, multi-walled thin, <5% Metal Oxide(TGA)   Catalytic Carbon Vapor Deposition (CCVD) Method
755125 Carbon nanotube, multi-walled, carboxylic acid functionalized thin, extent of labeling: >8% carboxylic acid functionalized, avg. diam. × L 9.5 nm × 1.5 μm >80% carbon basis
Catalytic Carbon Vapor Deposition (CCVD) Method
698849 Carbon nanotube, multi-walled >98% carbon basis, O.D. × L 6-13 nm × 2.5-20 μm Green Alternative >98% carbon basis
Chemical Vapor Deposition (CVD) Method
659258 Carbon nanotube, multi-walled >90% carbon basis, D × L 110-170 nm × 5-9 μm Green Alternative >90% carbon basis
Chemical Vapor Deposition (CVD) Method
901019 Carbon nanotube, multi-walled 50-90 nm diameter, >95% carbon basis >95% carbon basis
Chemical Vapor Deposition (CVD) Method
901002 Carbon nanotube, multi-walled flake of bundled CNTs, >95% carbon basis, O.D. × L 10-40 nm × 0.5-1.5 mm >95% carbon basis
Chemical Vapor Deposition (CVD) Method
901052 Carbon nanotube array, multi-walled vertically aligned on Si substrate, height 1.0 mm ≥98% (carbon as CNT)
Chemical Vapor Deposition (CVD) method.
901051 Carbon nanotube array, multi-walled vertically aligned on Si substrate, H 0.5 mm 98% (carbon as CNT)
Chemical Vapor Deposition (CVD) method.
901046 Carbon nanotube array, multi-walled, drawable vertically aligned on Si substrate 98% (carbon as CNT)
Chemical Vapor Deposition (CVD) method.
901082 Carbon nanotube sheet aligned, size × thickness 100 mm × 100 mm × 1-5 μm >95% (carbon)
Chemical Vapor Deposition (CVD) method.
900788 Carbon nanotube, few-walled carbon ≥95 %, D × L 2.5-3 nm × 2-6 μm ≥94% (carbon as CNT by TGA)
CoMoCAT synthesis process
412988 Carbon nanotube, multi-walled as-produced cathode deposit, >7.5% MWCNT basis, O.D. × L 7-15 nm × 0.5-10 μm Green Alternative >7.5% MWCNT basis
Electric Arc Discharge Method
406074 Carbon nanotube, multi-walled powdered cylinder cores, 20-30% MWCNT basis, O.D. × L 7-12 nm × 0.5-10 μm Green Alternative 20-30% MWCNT basis
Electric Arc Discharge Method
687804 Carbon nanotube array, multi-walled vertically aligned on silicon wafer substrate >95 atom % carbon basis (x-ray)
Plasma-Enhanced Chemical Vapor Deposition (PECVD) Method