This product has not been tested for use in this application. Based on the trace metals purity and form of the copper beads, suitability for e-beam deposition is expected.
Seleccione un Tamaño
| A ustedes/SKU | Disponibilidad | Precio |
|---|---|---|
50 g | Comprobar disponibilidad del carrito | MXP 4,600.00 |
250 g | Comprobar disponibilidad del carrito | MXP 13,388.00 |
Acerca de este artículo
Quality Segment
assay
≥99.99% trace metals basis
form
beads
composition
Cu
reaction suitability
core: copper
resistivity
1.673 μΩ-cm, 20°C
particle size
2-8 mm
bp
2567 °C (lit.)
mp
1083.4 °C (lit.)
density
8.94 g/mL at 25 °C (lit.)
application(s)
electroplating
metallization
SMILES string
[Cu]
InChI
1S/Cu
InChI key
RYGMFSIKBFXOCR-UHFFFAOYSA-N
1 of 1
Este artículo | |||
|---|---|---|---|
| description beads, 2-8 mm, ≥99.99% trace metals basis | description beads, 2-8 mm, 99.9995% trace metals basis | description powder (dendritic), <45 μm, 99.7% trace metals basis | description powder, <425 μm, 99.5% trace metals basis |
| assay ≥99.99% trace metals basis | assay 99.9995% trace metals basis | assay 99.7% trace metals basis | assay 99.5% trace metals basis |
| form beads | form beads | form powder (dendritic) | form powder |
| resistivity 1.673 μΩ-cm, 20°C | resistivity 1.673 μΩ-cm, 20°C | resistivity 1.673 μΩ-cm, 20°C | resistivity 1.673 μΩ-cm, 20°C |
| density 8.94 g/mL at 25 °C (lit.) | density 8.94 g/mL at 25 °C (lit.) | density 8.94 g/mL at 25 °C (lit.) | density 8.94 g/mL at 25 °C (lit.) |
| mp 1083.4 °C (lit.) | mp 1083.4 °C (lit.) | mp 1083.4 °C (lit.) | mp 1083.4 °C (lit.) |
| bp 2567 °C (lit.) | bp 2567 °C (lit.) | bp 2567 °C (lit.) | bp 2567 °C (lit.) |
Clase de almacenamiento
13 - Non Combustible Solids
wgk
WGK 2
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Gloves, type N95 (US)
Elija entre una de las versiones más recientes:
¿Ya tiene este producto?
Encuentre la documentación para los productos que ha comprado recientemente en la Biblioteca de documentos.
-
Is this Copper (Cu) product suitable for use as a source material in an e-beam evaporator for thin-film deposition?
1 answer-
Helpful?
-
