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description
100-2000 nm, thickness < 3 layers
form
suspension
concentration
5 mg/mL in H2O
General description
Application
1 of 1
Este artículo | |||
|---|---|---|---|
| description 100-2000 nm, thickness < 3 layers | description 100-2000 nm, thickness < 3 layers | description - | description Monolayer h-BN |
| concentration 5 mg/mL in H2O | concentration 1 mg/mL in H2O | concentration - | concentration - |
| form suspension | form liquid | form powder | form - |
2D hexagonal boron nitride dielectric layer | - | - | 2D hexagonal boron nitride for nanophotonic applications, 6 eV wide-bandgap boron nitride, h-BN monolayer on Si/SiO<sub>2</sub> wafer, hBN wafer for micro/nano actuators, high-purity hexagonal boron nitride wafer, high-strength hexagonal boron nitride for electronic devices, laboratory-grade boron nitride for research applications, monolayer boron nitride for optoelectronic devices, monolayer hBN crystal for quantum communication, monolayer hBN for MEMS and NEMS devices, monolayer hexagonal boron nitride, optical functional hexagonal boron nitride materials, single-layer boron nitride for aerospace industry, transparent insulating coatings hexagonal boron nitride |
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Clase de almacenamiento
12 - Non Combustible Liquids
wgk
WGK 2
flash_point_f
Not applicable
flash_point_c
Not applicable
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