Amidinate Precursors

Chemfiles Volume 4 Article 3

Developed with Professor Roy Gordon at Harvard, we present these exciting new precursors for Atomic Layer Deposition. The amidinates are volatile, homoleptic transition metal precursors, which meet the rigorous standards for ALD applications. When employed in ALD processes, these precursors allow for the deposition of pure metals when reacted with H2 gas or oxides when co-reacted with water vapor.1 The precursors can be vaporized appreciably at temperatures between 50-100 °C for the transition metal compounds and at 130 °C for the lanthanum compound. Deposition temperatures range between 150-350 °C.

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  1. Lim, B.S.; Rahtu, A.; Park, J.S.; Gordon, R.G.; Inorg. Chem., 2003, 42, 7951.

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