Saltar al contenido
Merck

Thin films of homopolymers and cylinder-forming diblock copolymers under shear.

ACS nano (2014-08-12)
Arash Nikoubashman, Raleigh L Davis, Brian T Michal, Paul M Chaikin, Richard A Register, Athanassios Z Panagiotopoulos
RESUMEN

We study thin films of homopolymers (PS) and monolayers of cylinder-forming diblock copolymers (PS–PHMA) under shear. To this end, we employed both experiments and computer simulations that correctly take into account hydrodynamic interactions and chain entanglements. Excellent quantitative agreement for static as well as dynamic properties in both the homopolymer and diblock copolymer cases was achieved. In particular, we found that the homopolymer thin films exhibit a distinct shear thinning behavior, which is strongly correlated with the disentanglement and shear alignment of the constituent polymer chains. For the PS–PHMA films, we show that shear can be employed to induce long-range ordering to the spontaneously self-assembled microdomains, which is required for many applications such as the fabrication of nanowire arrays. We found that the impact of chemical incompatibility on the viscosity is only minor in shear-aligned films. Once the domains were aligned, the films exhibited an almost Newtonian response to shear because the cylindrical microdomains acted as guide rails, along which the constituent copolymer chains could simply slide. Furthermore, we developed a model for predicting the onset of shear alignment based on equilibrium dynamics data, and found good agreement with our shear simulations. The employed computational method holds promise for a faster and more cost-effective route for developing custom tailored materials.

MATERIALES
Número de producto
Marca
Descripción del producto

Sigma-Aldrich
Metanol, suitable for HPLC, ≥99.9%
Sigma-Aldrich
Tetrahidrofuran, inhibitor-free, suitable for HPLC, ≥99.9%
Sigma-Aldrich
Metanol, ACS reagent, ≥99.8%
Sigma-Aldrich
Tolueno, ACS reagent, ≥99.5%
Sigma-Aldrich
Tetrahidrofuran, contains 200-400 ppm BHT as inhibitor, ACS reagent, ≥99.0%
Sigma-Aldrich
Metanol, HPLC Plus, ≥99.9%
Sigma-Aldrich
Tetrahidrofuran, anhydrous, ≥99.9%, inhibitor-free
Sigma-Aldrich
Cloruro de litio, ACS reagent, ≥99%
Sigma-Aldrich
Tolueno, HPLC Plus, for HPLC, GC, and residue analysis, ≥99.9%
Sigma-Aldrich
Metanol, Laboratory Reagent, ≥99.6%
Sigma-Aldrich
Metanol, suitable for HPLC, gradient grade, suitable as ACS-grade LC reagent, ≥99.9%
Sigma-Aldrich
Cloruro de litio, anhydrous, free-flowing, Redi-Dri, ReagentPlus®, 99%
Sigma-Aldrich
Cloruro de litio, anhydrous, free-flowing, Redi-Dri, ACS reagent, ≥99%
Sigma-Aldrich
Metanol, ACS spectrophotometric grade, ≥99.9%
Sigma-Aldrich
Metanol, ACS reagent, ≥99.8%
Sigma-Aldrich
Cloruro de litio, ReagentPlus®, 99%
Sigma-Aldrich
sec-Butyllithium solution, 1.4 M in cyclohexane
Sigma-Aldrich
Lithium chloride solution, 8 M, Molecular Biology, ≥99%
Sigma-Aldrich
Cloruro de litio, Molecular Biology, ≥99%
Sigma-Aldrich
Metanol, Absolute - Acetone free
USP
Metanol, United States Pharmacopeia (USP) Reference Standard
Sigma-Aldrich
Cloruro de litio, powder, ≥99.98% trace metals basis
Sigma-Aldrich
Metanol, BioReagent, ≥99.93%
Sigma-Aldrich
Tolueno, ACS reagent, ≥99.5%
Supelco
Electrolyte solution, nonaqueous, 2 M LiCl in ethanol
Supelco
Metanol, analytical standard
Supelco
Metanol, Pharmaceutical Secondary Standard; Certified Reference Material
Sigma-Aldrich
Tetrahidrofuran, ACS reagent, ≥99.0%, contains 200-400 ppm BHT as inhibitor
Sigma-Aldrich
Metanol, ACS reagent, ≥99.8%
Supelco
Tolueno, analytical standard