759414

Tetraethyl orthosilicate

packaged for use in deposition systems

• Synonym(s): Tetraethyl orthosilicate, Orthosilicic acid tetraethyl ester, Silicon tetraethoxide, Tetraethoxysilane, Tetraethoxysilicon(IV), Tetraethyl silicate, TEOS
• Linear Formula: Si(OC₂H₅)₄
• CAS Number: 78-10-4
• Molecular Weight: 208.33
• Beilstein: 1422225
• EC Number: 201-083-8
• MDL number: MFCD00009062
• UNSPSC Code: 12352103
• PubChem Substance ID: 329766783
• NACRES: NA.23

Properties

• vapor density: 7.2 (vs air)
• vapor pressure: <1 mmHg ( 20 °C)
• Assay: ≥99.5% (GC)
• form: liquid
• refractive index: n20/D 1.382 (lit.)
• bp: 168 °C (lit.)
• density: 0.933 g/mL at 20 °C (lit.)
• SMILES string: CCO[Si](OCC)(OCC)OCC
• InChI: 1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3
• InChI key: BOTDANWDWHJENH-UHFFFAOYSA-N

Description

Application

Commonly used as a precursor to prepare xerogel

Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:

• Si oxide
• Oxycarbide
• Doped silicate
• Silanol
• Siloxane polymer
• Organosilicon thin films

The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.

Will interact with dodecylamine in the formation of intercalation compounds of H⁺-magadiite and used in a study of mixed-metal bioactive glasses.

Safety Information

• Pictograms: GHS02,GHS07
• Signal Word: Warning
• Hazard Statements: H226,H319,H332,H335
• Precautionary Statements: P210 - P233 - P240 - P241 - P304 + P340 + P312 - P305 + P351 + P338
• Hazard Classifications: Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3
• Target Organs: Respiratory system
• Storage Class Code: 3 - Flammable liquids
• WGK: WGK 1
• Flash Point(F): 113.0 °F - closed cup
• Flash Point(C): 45 °C - closed cup