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Merck
Quantum® Polishing Cartridge Removes trace ionic and organic contaminants. For volatile organic-sensitive applications (e.g. GC-MS). For Direct-Q® and Milli-Q® Academic/Biocel/Gradient/Synthesis systems.

Quantum® Polishing Cartridge

Quantum® Polishing Cartridge Removes trace ionic and organic contaminants. For volatile organic-sensitive applications (e.g. GC-MS). For Direct-Q® and Milli-Q® Academic/Biocel/Gradient/Synthesis systems.

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QTUM0TEX1

Quantum® Polishing Cartridge, Removes trace ionic and organic contaminants. For Milli-Q® Advantage A10/Integral/Reference systems connected to ultrapure water feed.

QTUM000EX

Quantum® Polishing Cartridge, Contains Organex & Ionex Resins to remove trace levels of organics and ions. For Milli-Q® Academic/Biocel/Gradient/Synthesis systems.

QTUM0TIX1

Quantum® Polishing Cartridge, Removes trace ionic and organic contaminants. For Milli-Q® Advantage A10/Integral/Reference systems connected to ultrapure water feed.

QTUM00ICP

Quantum® Polishing Cartridge, For trace- and ultra-trace elemental analysis. For Milli-Q® Element (2001-2009) and Q-POD® Element purification units connected to ultrapure feed water.

QTUM000IX

Quantum® Polishing Cartridge, Removes trace ionic and organic contaminants. For Direct-Q® and Milli-Q®Academic/Biocel/Gradient/Synthesis systems.

QTUM000VX

Quantum® Polishing Cartridge, Removes trace ionic and organic contaminants. For volatile organic-sensitive applications (e.g. GC-MS). For Direct-Q® and Milli-Q® Academic/Biocel/Gradient/Synthesis systems.