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GF84327510

Tantalum

foil, not light tested, 25x25mm, thickness 0.01mm, 99.9%

Synonym(s):

Tantalum, TA000290, Ta

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About This Item

Empirical Formula (Hill Notation):
Ta
CAS Number:
Molecular Weight:
180.95
MDL number:
UNSPSC Code:
12141741
PubChem Substance ID:
NACRES:
NA.23

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vapor pressure

<0.01 mmHg ( 537.2 °C)

Assay

99.9%

form

foil

autoignition temp.

572 °F

manufacturer/tradename

Goodfellow 843-275-10

resistivity

13.5 μΩ-cm, 20°C

size × thickness

25 x 25 mm × 0.001 mm

bp

5425 °C (lit.)

mp

2996 °C (lit.)

density

16.69 g/cm3 (lit.)

SMILES string

[Ta]

InChI

1S/Ta

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

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GF19351289GF59915818GF00815958
manufacturer/tradename

Goodfellow 843-275-10

manufacturer/tradename

Goodfellow 193-512-89

manufacturer/tradename

Goodfellow 599-158-18

manufacturer/tradename

Goodfellow 008-159-58

assay

99.9%

assay

99.90%

assay

99.9%

assay

≥99.9%

form

foil

form

foil

form

foil

form

foil

density

16.69 g/cm3 (lit.)

density

16.69 g/cm3 (lit.)

density

16.69 g/cm3 (lit.)

density

16.69 g/cm3 (lit.)

bp

5425 °C (lit.)

bp

5425 °C (lit.)

bp

5425 °C (lit.)

bp

5425 °C (lit.)

resistivity

13.5 μΩ-cm, 20°C

resistivity

13.5 μΩ-cm, 20°C

resistivity

13.5 μΩ-cm, 20°C

resistivity

13.5 μΩ-cm, 20°C

General description

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Tantalum foil cuffs in peripheral nerve surgery.
E E CLIFFTON
Surgery, 23(3), 507-514 (1948-03-01)
Tantalum foil pegs.
E MAXWELL
American journal of ophthalmology, 34(3), 444-444 (1951-03-01)
Radmila Panajotovic et al.
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
T Y Hung et al.
Applied optics, 31(22), 4397-4404 (1992-08-01)
A simple four-element fused-silica lens is presented that has a focal length of 31.2 mm and a relative aperture of f/1 for use as a focusing lens for deep UV laser processing. The curvature of the lens is designed with
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly

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