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Merck

366994

Titanium

powder, <45 μm avg. part. size, 99.98% trace metals basis

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About This Item

Empirical Formula (Hill Notation):
Ti
CAS Number:
7440-32-6
Molecular Weight:
47.87
NACRES:
NA.23
PubChem Substance ID:
24862378
UNSPSC Code:
12141746
EC Number:
231-142-3
MDL number:
MFCD00011264

Key Documents

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Product Name

Titanium, powder, <45 μm avg. part. size, 99.98% trace metals basis

InChI key

RTAQQCXQSZGOHL-UHFFFAOYSA-N

InChI

1S/Ti

SMILES string

[Ti]

assay

99.98% trace metals basis

form

powder

autoignition temp.

860 °F

resistivity

42.0 μΩ-cm, 20°C

avg. part. size

<45 μm

bp

3287 °C (lit.)

mp

1660 °C (lit.)

density

4.5 g/mL at 25 °C (lit.)

Quality Level

100

Application

45 μm sized Titanium was used to prepare dense TiC/TiB2 composite by spark plasma synthesis and Ti-6Al-7Nb alloys.

pictograms

Flame
GHS02

signalword

Danger

hcodes

H228

Hazard Classifications

Flam. Sol. 1

Storage Class

4.2 - Pyrophoric and self-heating hazardous materials

wgk

nwg

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Gloves, type N95 (US)

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Certificates of Analysis (COA)

Lot/Batch Number
MKCX8809
MKCV6332
MKCT5217
MKCQ5108
MKCM7178

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Effect of ball milling on simultaneous spark plasma synthesis and densification of TiC?TiB 2 composites.
Locci AM, et al.
Materials Science & Engineering. A, Structural Materials : Properties, Microstructure and Processing, 434.1, 23-29 (2006)
Simultaneous spark plasma synthesis and densification of TiC?TiB2 composites.
Locci AM, et al.
Journal of the American Ceramic Society. American Ceramic Society, 89.3, 848-855 (2006)
Progress in titanium metal powder injection molding.
German RM.
Materials, 6.8, 3641-3662 (2013)
A Kurbad et al.
International journal of computerized dentistry, 16(2), 125-141 (2013-08-13)
This article presents two novel options for lithium-disilicate restorations supported by single-tooth implants. By using a Ti-Base connector, hybrid abutments and hybrid abutment crowns can be fabricated for different implant systems. The latter option in particular is an interesting new
J H Kim et al.
Journal of nanoscience and nanotechnology, 13(7), 4601-4607 (2013-08-02)
Nanocytalline TiN films were deposited on non-alkali glass and Al substrates by reactive DC magnetron sputtering (DCMS) with an electromagnetic field system (EMF). The microstructure and corrosion resistance of the TiN-coated Al substrates were estimated by X-ray diffraction (XRD), scanning
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