Produktnummer
Marke
Produktbeschreibung
Sigma-Aldrich
Tetrahydrofuran, inhibitor-free, suitable for HPLC, ≥99.9%
Sigma-Aldrich
Dichlormethan, suitable for HPLC, ≥99.8%, contains amylene as stabilizer
Sigma-Aldrich
Dichlormethan, contains 40-150 ppm amylene as stabilizer, ACS reagent, ≥99.5%
Sigma-Aldrich
Dichlormethan, HPLC Plus, for HPLC, GC, and residue analysis, ≥99.9%, contains 50-150 ppm amylene as stabilizer
Sigma-Aldrich
Tetrahydrofuran, contains 200-400 ppm BHT as inhibitor, ACS reagent, ≥99.0%
Sigma-Aldrich
1-Methyl-2-pyrrolidon, ACS reagent, ≥99.0%
Sigma-Aldrich
Tetrahydrofuran, anhydrous, ≥99.9%, inhibitor-free
Sigma-Aldrich
Dichlormethan, anhydrous, ≥99.8%, contains 40-150 ppm amylene as stabilizer
Sigma-Aldrich
Tetrahydrofuran, anhydrous, contains 250 ppm BHT as inhibitor, ≥99.9%
Sigma-Aldrich
1-Methyl-2-pyrrolidon, ReagentPlus®, 99%
Sigma-Aldrich
1-Methyl-2-pyrrolidon, anhydrous, 99.5%
Sigma-Aldrich
1-Methyl-2-pyrrolidon, suitable for HPLC, ≥99%
Sigma-Aldrich
1-Methyl-2-pyrrolidon, biotech. grade, ≥99.7%
Sigma-Aldrich
Dichlormethan, ACS reagent, ≥99.5%, contains 40-150 ppm amylene as stabilizer
Supelco
Dichlormethan, Pharmaceutical Secondary Standard; Certified Reference Material
Sigma-Aldrich
Tetrahydrofuran, ACS reagent, ≥99.0%, contains 200-400 ppm BHT as inhibitor
Sigma-Aldrich
Tantal(V)-ethoxid, 99.98% trace metals basis
Supelco
Dichlormethan, analytical standard
Sigma-Aldrich
Dichlormethan, ACS reagent, ≥99.5%, contains 40-150 ppm amylene as stabilizer
Supelco
Tetrahydrofuran, HPLC grade, ≥99.9%, inhibitor-free
Supelco
Tetrahydrofuran, analytical standard
Sigma-Aldrich
Dichlormethan, suitable for HPLC, ≥99.9%, contains 40-150 ppm amylene as stabilizer
Supelco
Tetrahydrofuran, Pharmaceutical Secondary Standard; Certified Reference Material
Supelco
1-Methyl-2-pyrrolidon, analytical standard
Sigma-Aldrich
Dichlormethan, biotech. grade, 99.9%, contains 40-150 ppm amylene as stabilizer
Supelco
Tetrahydrofuran, Selectophore™, ≥99.5%
Supelco
Dichlormethan, Selectophore™, ≥99.5%
Tantal(V)-ethoxid, packaged for use in deposition systems