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  • Hierarchically functionalized magnetic core/multishell particles and their postsynthetic conversion to polymer capsules.

Hierarchically functionalized magnetic core/multishell particles and their postsynthetic conversion to polymer capsules.

ACS nano (2015-03-25)
Sophia Schmitt, Martin Silvestre, Manuel Tsotsalas, Anna-Lena Winkler, Artak Shahnas, Sylvain Grosjean, Fabrice Laye, Hartmut Gliemann, Joerg Lahann, Stefan Bräse, Matthias Franzreb, Christof Wöll
ZUSAMMENFASSUNG

The controlled synthesis of hierarchically functionalized core/multishell particles is highly desirable for applications in medicine, catalysis, and separation. Here, we describe the synthesis of hierarchically structured metal-organic framework multishells around magnetic core particles (magMOFs) via layer-by-layer (LbL) synthesis. The LbL deposition enables the design of multishell systems, where each MOF shell can be modified to install different functions. Here, we used this approach to create controlled release capsules, in which the inner shell serves as a reservoir and the outer shell serves as a membrane after postsynthetic conversion of the MOF structure to a polymer network. These capsules enable the controlled release of loaded dye molecules, depending on the surrounding media.

MATERIALIEN
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Produktbeschreibung

Sigma-Aldrich
Dimethylsulfoxid-d6, 99.9 atom % D
Sigma-Aldrich
Dimethylsulfoxid-d6, 99.9 atom % D, contains 0.03 % (v/v) TMS
Sigma-Aldrich
Ethyl alcohol, Pure, 200 proof, anhydrous, ≥99.5%
Sigma-Aldrich
Toluol, anhydrous, 99.8%
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, 99%
Sigma-Aldrich
Dimethylsulfoxid-d6, 99.5 atom % D
Sigma-Aldrich
Ethyl alcohol, Pure, 190 proof, ACS spectrophotometric grade, 95.0%
Sigma-Aldrich
p-Toluolsulfonsäure Monohydrat, ACS reagent, ≥98.5%
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, ≥98.0%
Sigma-Aldrich
p-Toluolsulfonsäure Monohydrat, ≥99% (calc. to H2O free subst.)
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, ≥98%
Sigma-Aldrich
p-Toluolsulfonsäure Monohydrat, ReagentPlus®, ≥98%
Sigma-Aldrich
Dimethylsulfoxid-d6, "100%", 99.96 atom % D
Sigma-Aldrich
Propiolsäure, 95%
Sigma-Aldrich
Dimethylsulfoxid-d6, 99.9 atom % D, contains 1 % (v/v) TMS
Sigma-Aldrich
Dimethylsulfoxid-d6, anhydrous, 99.9 atom % D
Sigma-Aldrich
1,1,1-Tris(hydroxymethyl)-ethan, ≥98%
Sigma-Aldrich
Dimethylsulfoxid-d6, "Special HOH", ≥99.9 atom % D
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, packaged for use in deposition systems, ≥98%
Sigma-Aldrich
Dimethylsulfoxid-d6, "100%", 99.96 atom % D, contains 0.03 % (v/v) TMS
Sigma-Aldrich
Dimethylsulfoxid-d6, "100%", 99.96 atom % D
Sigma-Aldrich
Dimethylsulfoxid-d6, 99.9 atom % D
Sigma-Aldrich
Dimethylsulfoxid-d6, "100%", 99.96 atom % D