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  • Xerogel-sequestered silanated organochalcogenide catalysts for bromination with hydrogen peroxide and sodium bromide.

Xerogel-sequestered silanated organochalcogenide catalysts for bromination with hydrogen peroxide and sodium bromide.

Molecules (Basel, Switzerland) (2015-05-29)
Caitlyn M Gatley, Lisa M Muller, Meredith A Lang, Eduardo E Alberto, Michael R Detty
ZUSAMMENFASSUNG

While H2O2 is a powerful oxidant, decomposing into environmentally benign H2O and O2, a catalyst is often required for reactions with H2O2 to proceed at synthetically useful rates. Organotellurium and organoselenium compounds catalyze the oxidation of halide salts to hypohalous acids using H2O2. When sequestered into xerogel monoliths, the xerogel-chalcogenide combinations have demonstrated increased catalytic activity relative to the organochalcogen compound alone in solution for the oxidation of halide salts to hypohalous acids with H2O2. Diorganotellurides, diorganoselenides, and diorganodiselenides bearing triethoxysilane functionalities were sequestered into xerogel monoliths and their catalytic activity and longevity were investigated. The longevity of the catalyst-xerogel combinations was examined by isolating and recycling the catalyst-xerogel combination. It was found tellurium-containing catalyst 3 and selenium-containing catalyst 8 maintained their catalytic activity through three recycling trials and adding electron-donating substituents to catalyst 3 also increased the catalytic rate. The presence of organotellurium and organoselenium groups in the +4 oxidation state was determined by X-ray photoelectron spectroscopy.

MATERIALIEN
Produktnummer
Marke
Produktbeschreibung

Sigma-Aldrich
Wasserstoffperoxid -Lösung, 30 % (w/w) in H2O, contains stabilizer
Sigma-Aldrich
Tetraethylorthosilikat, reagent grade, 98%
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, 99%
Sigma-Aldrich
Schwefelsäure, 99.999%
Sigma-Aldrich
4-(Dimethylamino)-pyridin, ReagentPlus®, ≥99%
Sigma-Aldrich
Tetraethylorthosilikat, ≥99.0% (GC)
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, ≥98.0%
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, ≥98%
Sigma-Aldrich
Tetraethylorthosilikat, 99.999% trace metals basis
Sigma-Aldrich
Wasserstoffperoxid -Lösung, 34.5-36.5%
Sigma-Aldrich
Diphenyldiselenid, 98%
Sigma-Aldrich
Trimethoxy[3-(methylamino)propyl]silan, 95%
Sigma-Aldrich
(3-Aminopropyl)triethoxysilan, packaged for use in deposition systems, ≥98%
Sigma-Aldrich
Tetraethylorthosilicat, packaged for use in deposition systems