- Porous silicon advances in drug delivery and immunotherapy.
Porous silicon advances in drug delivery and immunotherapy.
Current opinion in pharmacology (2013-07-13)
David J Savage, Xuewu Liu, Steven A Curley, Mauro Ferrari, Rita E Serda
PMID23845260
要旨
Biomedical applications of porous silicon include drug delivery, imaging, diagnostics and immunotherapy. This review summarizes new silicon particle fabrication techniques, dynamics of cellular transport, advances in the multistage vector approach to drug delivery, and the use of porous silicon as immune adjuvants. Recent findings support superior therapeutic efficacy of the multistage vector approach over single particle drug delivery systems in mouse models of ovarian and breast cancer. With respect to vaccine development, multivalent presentation of pathogen-associated molecular patterns on the particle surface creates powerful platforms for immunotherapy, with the porous matrix able to carry both antigens and immune modulators.
材料
製品番号
ブランド
製品内容
Sigma-Aldrich
ケイ素, wafer (single side polished), <100>, N-type, contains no dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <111>, N-type, contains no dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <100>, P-type, contains boron as dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <100>, P-type, contains boron as dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <100>, N-type, contains no dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), contains phosphorus as dopant, <111>, N-type, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer, <111>, P-type, contains boron as dopant, diam. × thickness 2 in. × 0.3 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <100>, N-type, contains phosphorus as dopant, diam. × thickness 2 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <100>, N-type, contains phosphorus as dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <111>, P-type, contains boron as dopant, diam. × thickness 3 in. × 0.5 mm
Sigma-Aldrich
ケイ素, wafer (single side polished), <111>, N-type, contains no dopant, diam. × thickness 3 in. × 0.5 mm
ケイ素, sheet, 52x52mm, thickness 1.0mm, polycrystalline, 99.999%
ケイ素, disks, 15.9mm, thickness 0.38mm, single crystal, n-type, 100%
ケイ素, sheet, 10x10mm, thickness 0.5mm, single crystal, -100, 100%
ケイ素, sheet, 10x10mm, thickness 0.6mm, single crystal, -100, 100%
ケイ素, rod, 80mm, diameter 20mm, single crystal, -100, 99.999%
ケイ素, sheet, 40x40mm, thickness 3.0mm, single crystal, p-type, 100%
ケイ素, rod, 40mm, diameter 20mm, single crystal, -100, 99.999%
ケイ素, disks, 13mm, thickness 0.38mm, single crystal, 100%
ケイ素, rod, 50mm, diameter 2.0mm, crystalline, 100%
ケイ素, sheet, 25x25mm, thickness 1.0mm, polycrystalline, 99.999%
ケイ素, rod, 50mm, diameter 5mm, single crystal, -100, 99.999%
ケイ素, rod, 100mm, diameter 25mm, crystalline, 100%
ケイ素, sheet, 25x25mm, thickness 1.0mm, single crystal, -100, 100%
ケイ素, disks, 15.9mm, thickness 0.38mm, single crystal, n-type, 100%
ケイ素, rod, 50mm, diameter 5mm, single crystal, -111, 99.999%
ケイ素, rod, 25mm, diameter 3.15mm, single crystal - random orientation, 100%