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GF99542368

Tantalum

foil, 10mm disks, thickness 0.03mm, as rolled, 99.9%

Synonym(s):

Tantalum, TA000348, Ta

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10 EA

HUF 425,000.00

HUF 425,000.00

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About This Item

Empirical Formula (Hill Notation):
Ta
CAS Number:
7440-25-7
Molecular Weight:
180.95
NACRES:
NA.23
PubChem Substance ID:
329815042
UNSPSC Code:
12141741
MDL number:
MFCD00011252

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Product Name

Tantalum, foil, 10mm disks, thickness 0.03mm, as rolled, 99.9%

InChI

1S/Ta

SMILES string

[Ta]

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

vapor pressure

<0.01 mmHg ( 537.2 °C)

assay

≥99.9%

form

foil

autoignition temp.

572 °F

manufacturer/tradename

Goodfellow 995-423-68

resistivity

13.5 μΩ-cm, 20°C

bp

5425 °C (lit.)

mp

2996 °C (lit.)

density

16.69 g/cm3 (lit.)

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Tantalum foil, 10mm disks, thickness 0.03mm, as rolled, 99.9%

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GF09020191

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GF37205546

Tantalum

Tantalum foil, 8mm disks, thickness 0.03mm, as rolled, 99.9%

GF67039791

Tantalum

assay

≥99.9%

assay

≥99.9%

assay

99.9%

assay

≥99.9%

form

foil

form

foil

form

foil

form

foil

manufacturer/tradename

Goodfellow 995-423-68

manufacturer/tradename

Goodfellow 090-201-91

manufacturer/tradename

Goodfellow 372-055-46

manufacturer/tradename

Goodfellow 670-397-91

density

16.69 g/cm3 (lit.)

density

16.69 g/cm3 (lit.)

density

16.69 g/cm3 (lit.)

density

16.69 g/cm3 (lit.)

mp

2996 °C (lit.)

mp

2996 °C (lit.)

mp

2996 °C (lit.)

mp

2996 °C (lit.)

bp

5425 °C (lit.)

bp

5425 °C (lit.)

bp

5425 °C (lit.)

bp

5425 °C (lit.)

General description

For updated SDS information please visit www.goodfellow.com.

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Tantalum foil pegs.
E MAXWELL
American journal of ophthalmology, 34(3), 444-444 (1951-03-01)
Tantalum foil cuffs in peripheral nerve surgery.
E E CLIFFTON
Surgery, 23(3), 507-514 (1948-03-01)
Radmila Panajotovic et al.
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
T Y Hung et al.
Applied optics, 31(22), 4397-4404 (1992-08-01)
A simple four-element fused-silica lens is presented that has a focal length of 31.2 mm and a relative aperture of f/1 for use as a focusing lens for deep UV laser processing. The curvature of the lens is designed with
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
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