- Atomic layer deposition ultrathin film origami using focused ion beams.
Atomic layer deposition ultrathin film origami using focused ion beams.
Nanotechnology (2016-11-12)
O D Supekar, J J Brown, N T Eigenfeld, J C Gertsch, V M Bright
PMID27834312
要旨
Focused ion beam (FIB) micromachining is a powerful tool for maskless lithography and in recent years FIB has been explored as a tool for strain engineering. Ion beam induced deformation can be utilized as a means for folding freestanding thin films into complex 3D structures. FIB of high energy gallium (Ga
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