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496863

Pentakis(dimethylamino)tantalum(V)

99.99%

Pentakis(dimethylamino)tantalum(V)
1 of 1 reviewers took part in a promotion

Synonym(s):

PDMAT, TADMA, Ta(NMe2)5, Tantalum dimethylamide

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5 G

$231.75

$231.75

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About This Item

Linear Formula:
Ta(N(CH3)2)5
CAS Number:
19824-59-0
Molecular Weight:
401.33
MDL number:
MFCD01631286
UNSPSC Code:
12352103
PubChem Substance ID:
24873088
NACRES:
NA.23

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Quality Level

100

assay

99.99%

form

solid

reaction suitability

core: tantalum
reagent type: catalyst

mp

100 °C (dec.) (lit.)

SMILES string

CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C

InChI

1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5

InChI key

VSLPMIMVDUOYFW-UHFFFAOYSA-N

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This Item
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Pentakis(dimethylamino)tantalum(V) 99.99%

Sigma-Aldrich

496863

Pentakis(dimethylamino)tantalum(V)

Tris(diethylamido)(tert-butylimido)tantalum(V) packaged for use in deposition systems

Sigma-Aldrich

668990

Tris(diethylamido)(tert-butylimido)tantalum(V)

Tris(diethylamido)(tert-butylimido)tantalum(V) 99%, ≥99.99% trace metals basis

Sigma-Aldrich

521280

Tris(diethylamido)(tert-butylimido)tantalum(V)

Tetrakis(dimethylamido)titanium(IV) packaged for use in deposition systems

Sigma-Aldrich

669008

Tetrakis(dimethylamido)titanium(IV)

assay

99.99%

assay

≥99.99% (trace metals analysis)

assay

≥99.99% trace metals basis

assay

99.999% (trace metals analysis)

form

solid

form

liquid

form

liquid

form

liquid

mp

100 °C (dec.) (lit.)

mp

-

mp

-

mp

-

reaction suitability

core: tantalum

reaction suitability

core: tantalum

reaction suitability

core: tantalum, reagent type: catalyst

reaction suitability

core: titanium

Quality Level

100

Quality Level

100

Quality Level

200

Quality Level

100

General description

Atomic number of base material: 73 Tantalum

Features and Benefits

Volatile solid CVD precursor to tantalum nitride (TaN) thin films. Also yields tantalum oxide (Ta2O5) thin films when O2, H2O, NO or H2O2 is present during the deposition process. Ta2O5 thins films show promise as gate dielectric materials in the manufacture of integrated circuits.

pictograms

FlameCorrosion
GHS02,GHS05

signalword

Danger

Hazard Classifications

Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react 1

Storage Class

4.3 - Hazardous materials which set free flammable gases upon contact with water

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges

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Certificates of Analysis (COA)

Lot/Batch Number
SHBP9453
SHBG7719V
SHBC8197V
SHBB0436V
29796BP

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James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume

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